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Published October 27, 1988 | public
Journal Article Open

Generation of 1180 Å period gratings with a Xe ion laser

Abstract

Holographic lithography with the 2315 Å line of a xenon ion laser is used to produce gratings in polymethylmethacrylate. An 1180 Å period grating is made and examined with a scanning electron microscope (SEM). This grating period is appropriate for use as a first-order grating with a GaAs distributed feedback laser.

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©1988 IEE. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the IEE.

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