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Published April 1, 2007 | public
Journal Article Open

Relationship between resolution enhancement and multiphoton absorption rate in quantum lithography

Tsang, Mankei

Abstract

The proposal of quantum lithography [Boto et al., Phys. Rev. Lett. 85, 2733 (2000)] is studied via a rigorous formalism. It is shown that, contrary to Boto et al.'s heuristic claim, the multiphoton absorption rate of a (|N,0>+|0,N>) quantum state is actually lower than that of a classical state with otherwise identical parameters. The proof-of-concept experiment of quantum lithography [D'Angelo et al., Phys. Rev. Lett. 87, 013602 (2001)] is also analyzed in terms of the proposed formalism, and the experiment is shown to have a reduced multiphoton absorption rate in order to emulate quantum lithography accurately. Finally, quantum lithography by the use of a jointly Gaussian quantum state of light is investigated to illustrate the trade-off between resolution enhancement and multiphoton absorption rate.

Additional Information

©2007 The American Physical Society (Received 16 July 2006; published 20 April 2007) Discussions with Demetri Psaltis, Robert W. Boyd, Jonathan P. Dowling, Bahaa E. A. Saleh, and Paul W. Kwiat are gratefully acknowledged. This work was financially supported by DARPA and the National Science Foundation through the Center for the Science and Engineering of Materials (DMR-0520565).

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