Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published April 1, 1982 | public
Journal Article Open

X-ray rocking curve study of Si-implanted GaAs, Si, and Ge

Abstract

Crystalline properties of Si-implanted <100> GaAs, Si, and Ge have been studied by Bragg case double-crystal x-ray diffraction. Sharp qualitative and quantitative differences were found between the damage in GaAs on one hand and Si and Ge on the other. In Si and Ge the number of defects and the strain increase linearly with dose up to the amorphous threshold. In GaAs the increase in these quantities is neither linear nor monotonic with dose. At a moderate damage level the GaAs crystal undergoes a transition from elastic to plastic behavior. This transition is accompanied by the creation of extended defects, which are not detected in Si or Ge.

Additional Information

© 1982 American Institute of Physics. Received 6 November 1981; accepted for publication 8 January 1982. We thank E. Babcock for performing the ion implantation, S.S. Lau for helpful discussions, and L.A. Moudy for technical assistance. This work was supported in part by the Advanced Research Agency of the Department of Defense and was monitored by the Air Force Office of Scientific Research under Contract No. 49620-TI-C-0087.

Files

SPEapl82.pdf
Files (297.3 kB)
Name Size Download all
md5:813f8d3e963819adba7199621aac1778
297.3 kB Preview Download

Additional details

Created:
August 22, 2023
Modified:
October 16, 2023