Published January 3, 2005
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Journal Article
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Three-dimensional macroporous silicon photonic crystal with large photonic band gap
Chicago
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Abstract
Three-dimensional photonic crystals based on macroporous silicon are fabricated by photoelectrochemical etching and subsequent focused-ion-beam drilling. Reflection measurements show a high reflection in the range of the stopgap and indicate the spectral position of the complete photonic band gap. The onset of diffraction which might influence the measurement is discussed.
Additional Information
©2005 American Institute of Physics. Received 30 April 2004; accepted 25 October 2004; published online 22 December 2004. J.S. and J.W. would like to thank George R. Rossman for providing the opportunity to use the FTIR spectrometer and microscope for the reflection measurements.Attached Files
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2006-06-08Created from EPrint's datestamp field
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