Published November 2004
| Published
Journal Article
Open
Soft lithography replica molding of critically coupled polymer microring resonators
Chicago
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Abstract
We use soft lithography replica molding to fabricate unclad polystyrene (PS) and clad SU-8 microring resonator filters. The PS resonator has an intrinsic quality factor of 1.0/spl times/10/sup 4/ at /spl lambda/=1.55 /spl mu/m, while that of the SU-8 resonator is 7100. The extinction ratios of the PS and SU-8 microring filters are -12 and -20 dB, respectively, with net insertion losses of 6.7 and 9.9 dB. The good quality factors and high extinction ratios of the microring resonator filters show the practicality of soft-lithography replica molding for the fabrication of integrated optical devices.
Additional Information
© 2004 IEEE. Reprinted with permission. Manuscript received May 20, 2004; revised July 8, 2004. This work was supported by the National Science Foundation (NSF), Defense Advanced Research Projects Agency (DARPA), and Hughes Research Laboratories (HRL). The work of J. Poon was supported by an NSERC-Julie Payette scholarship.Attached Files
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Additional details
- Eprint ID
- 2007
- Resolver ID
- CaltechAUTHORS:POOieeeptl04b
- NSF
- Defense Advanced Research Projects Agency (DARPA)
- Hughes Research Laboratories
- Natural Sciences and Engineering Research Council of Canada (NSERC)
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2006-03-01Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field