Microstructure and properties of single crystal BaTiO3 thin films synthesized by ion implantation-induced layer transfer
Abstract
Single crystal BaTiO3 thin films have been transferred onto Pt-coated and Si3N4-coated substrates by the ion implantation-induced layer transfer method using H+ and He+ ion coimplantation and subsequent annealing. The transferred BaTiO3 films are single crystalline with root mean square roughness of 17 nm. Polarized optical and piezoresponse force microscopy (PFM) indicate that the BaTiO3 film domain structure closely resembles that of bulk tetragonal BaTiO3 and atomic force microscopy shows a 90degrees a-c domain structure with a tetragonal angle of 0.5degrees-0.6degrees. Micro-Raman spectroscopy indicates that the local mode intensity is degraded in implanted BaTiO3 but recovers during anneals above the Curie temperature. The piezoelectric coefficient, d(33), is estimated from PFM to be 80-100 pm/V and the coercive electric field (E-c) is 12-20 kV/cm, comparable to those in single crystal BaTiO3.
Additional Information
© 2004 American Institute of Physics. Received 26 January 2004; accepted 25 May 2004. This work was supported by the Army Research Office (ARO-MURI) under Grant No. DAAD 19-01-1-0517. One of the authors (Y.-B.P.) wishes to acknowledge support by the Postdoctoral Fellowship Program of the Korea Science and Engineering Foundation (KOSEF).Attached Files
Published - PARapl04.pdf
Files
Name | Size | Download all |
---|---|---|
md5:64bbbb50d4e974afffe43d70521876df
|
248.9 kB | Preview Download |
Additional details
- Eprint ID
- 3406
- Resolver ID
- CaltechAUTHORS:PARapl04
- Army Research Office (ARO)
- DAAD 19-01-1-0517
- Korea Science and Engineering Foundation
- Created
-
2006-06-06Created from EPrint's datestamp field
- Updated
-
2021-11-08Created from EPrint's last_modified field