Evidence of Simultaneous Double-Electron Promotion in F+ Collisions with Surfaces
- Creators
- Mace, J.
- Gordon, M. J.
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Giapis, K. P.
Abstract
A high-flux beam of mass-filtered F+ at low energy (100–1300 eV) was scattered off Al and Si surfaces to study core-level excitations of F0 and F+. Elastic scattering behavior for F+ was observed at energies <300 (500) eV off Al (Si) for a 90° lab angle. However, above this energy threshold, orbital mixing in the hard collision step results in electronic excitation of F via molecular orbital promotion along the 4fsigma (F-2p), significantly reducing the observed ion exit energy. In addition, despite the electronegativity of F, scattering at energies >450 (700) eV off Al (Si) produces F2+—behavior which is remarkably similar to Ne+ off the same surfaces. Inelasticities measured for single collision events agree well with the energy deficits required to form (doubly excited) F** and F+** states from F0 and F+, respectively; these excited species most likely decay to inelastic F+ and F2+ via autoionization.
Additional Information
© 2006 The American Physical Society (Received 15 August 2006; published 22 December 2006) This work was based on research funded by the National Science Foundation (No. CTS-0317397).Attached Files
Published - MACprl06.pdf
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Additional details
- Eprint ID
- 6863
- Resolver ID
- CaltechAUTHORS:MACprl06
- NSF
- CTS-0317397
- Created
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2006-12-29Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field