Published June 1977
| public
Journal Article
Open
Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist
- Creators
- Livanos, A. C.
- Katzir, A.
- Shellan, J. B.
- Yariv, A.
Abstract
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
Additional Information
© Copyright 1977 Optical Society of America Received 27 November 1976. The authors thank D. R. Armstrong for his valuable technical assistance. This research was supported by the U.S. Air Force Office of Scientific Research. The work of J. B. Shellan is supported in part by the Hertz Foundation.Files
LIVao77.pdf
Files
(349.8 kB)
| Name | Size | Download all |
|---|---|---|
|
md5:dbc6242d1641a4f0a2c067e16dfd573d
|
349.8 kB | Preview Download |
Additional details
- Eprint ID
- 5910
- Resolver ID
- CaltechAUTHORS:LIVao77
- Created
-
2006-11-08Created from EPrint's datestamp field
- Updated
-
2019-10-02Created from EPrint's last_modified field