Published July 2000
| Published
Journal Article
Open
Fabrication of bismuth nanowires with a silver nanocrystal shadowmask
Chicago
An error occurred while generating the citation.
Abstract
We fabricated bismuth (Bi) nanowires with low energy electron beam lithography using silver (Ag) nanocrystal shadowmasks and a subsequent chlorine reactive ion etching. Submicron-size metal contacts on the single Bi nanowire were successfully prepared by in situ focused ion beam metal deposition for transport measurements. The temperature dependent resistance measurements on the 50 nm wide Bi nanowires showed that the resistance increased with decreasing temperature, which is characteristic of semiconductors and insulators.
Additional Information
© 2000 American Vacuum Society. (Received 1 October 1999; accepted 3 January 2000) The authors gratefully acknowledge support by the Augmentation Awards for Science and Engineering Research Training (AASERT) Fellowship Grant No. N00014-96-1-1258, the Office of Naval Research MURI, and ARO MURI and the U.S. Air Force under Contract No. F04701-93-C-0094. One of the authors (J.R.H.) acknowledges the Office of Naval Research Contract No. N00014-981-0422, and the Packard Foundation. PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETYAttached Files
Published - CHOjvsta00.pdf
Files
CHOjvsta00.pdf
Files
(138.5 kB)
| Name | Size | Download all |
|---|---|---|
|
md5:7844a21bf397ce649de488f0df731daf
|
138.5 kB | Preview Download |
Additional details
- Eprint ID
- 4234
- Resolver ID
- CaltechAUTHORS:CHOjvsta00
- Augmentation Awards for Science & Engineering Research Training (AASERT) Fellowship Grant
- N00014-96-1-1258
- Office of Naval Research (ONR)
- Army Research Office (ARO)
- Office of Naval Research (ONR)
- N00014-981-0422
- David and Lucile Packard Foundation
- Created
-
2006-08-08Created from EPrint's datestamp field
- Updated
-
2021-11-08Created from EPrint's last_modified field