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Published 2001 | public
Book Section - Chapter Open

Capacity limits and matching properties of lateral flux integrated capacitors

Abstract

Theoretical limits for the capacitance density of lateral flux and quasi-fractal capacitors are calculated. These limits are used to investigate the efficiency of various capacitive structures such as lateral flux and quasi-fractal structures. This study leads to two new capacitor structures with high lateral field efficiency. Simulation and experimental results demonstrate higher capacity and superior matching properties compared to the standard horizontal parallel plate and previously reported lateral-field capacitors.

Additional Information

© Copyright 2002 IEEE. Reprinted with permission. The authors acknowledge Conexant Systems, Newport Beach, CA for chip fabrication, and specially thank S. Lloyd, R. Magoon, B. Bhattacharyya, F. In'tveld, J. Yu and R. Hlavac. We would also like to acknowledge D. Ham, H. Hashemi, S. Koudounas, S. Mandegaran and H. Wu of Caltech for helpful discussions.

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