Using silicon disk resonators to measure mechanical losses caused by an electric field

Abstract

Several projects of the next generation gravitational-wave detectors use the high purity monocrystalline silicon test masses. The electric field of the actuator that is applied to correct the position of the silicon test mass causes additional mechanical losses and associated noise. Disk mechanical resonators are widely used to study mechanical losses in multilayer optical coatings that are deposited on the test masses of gravitational-wave detectors. We use silicon disk resonators to study losses caused by an electric field. In particular, the dependence of mechanical losses on the resistivity of silicon is investigated. The resonator is a thin commercial silicon wafer in which a low frequency nodal diameter mode is excited. A DC voltage is applied between the wafer and a nearby electrode. We use two measurement configurations. In the first configuration, the dependence of losses on the resistance in the voltage supply circuit is investigated. The dependence of losses on the resistivity of silicon is investigated in the second configuration. We propose a model that relates the electric field induced mechanical loss in disk resonators to the resistivity of the material. Measurements are carried out for low and high resistivity silicon wafers. The measurement results are compared with calculations. Based on these studies, it is possible to estimate the loss and noise of the test masses of gravitational-wave detectors associated with electrostatic actuators.

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