Published April 1, 2021
| Accepted Version + Published
Journal Article
Open
Two-dimensional extreme skin depth engineering for CMOS photonics
Abstract
Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate that e-skid can be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of two-dimensional (2D) e-skid directional couplers with large gaps and operational bandwidth. Here we experimentally validate 2D e-skid for integrated photonics in a complementary metal–oxide semiconductor (CMOS) photonics foundry and demonstrate strong coupling with a gap of 1.44 µm.
Additional Information
©2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement. Received 7 December 2020; revised 24 February 2021; accepted 27 February 2021; posted 2 March 2021 (Doc. ID 416848); published 24 March 2021. Funding: National Science Foundation (1810282); Air Force Research Laboratory (FA8650-15-2-5220, FA8750-16-2-0140). Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. The views and conclusions contained herein are those of the authors and should not be interpreted as necessarily representing the official policies or endorsements, either expressed or implied, of Air Force Research Laboratory or the U.S. Government. M. v. N. and S. F. P. would like to acknowledge Navin B. Lingaraju for sparking a collaboration between RIT and Purdue. The authors declare that there are no conflicts of interest related to this article.Attached Files
Published - josab-38-4-1307.pdf
Accepted Version - 2005.14265.pdf
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josab-38-4-1307.pdf
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Additional details
- Eprint ID
- 108876
- Resolver ID
- CaltechAUTHORS:20210429-132054258
- ECCS-1810282
- NSF
- FA8650-15-2-5220
- Air Force Research Laboratory
- FA8750-16-2-0140
- Air Force Research Laboratory
- Created
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2021-04-29Created from EPrint's datestamp field
- Updated
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2021-04-30Created from EPrint's last_modified field