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Published August 2020 | public
Journal Article

P-60: Single-Step Plasma-Enhanced Chemical Vapor Deposition of Graphene on Cu Ink and Sputtered Cu Thin Films

Abstract

Ink materials for Inkjet Printing generally suffer from low conductivity, whereas the thickness of Cu interconnects requires further reduction for better flexibility. Here we demonstrate successful growth of graphene on both Cu Ink and sputtered Cu by plasma‐enhanced chemical vapor deposition as a promising solution to address the aforementioned issues.

Additional Information

© 2020 The Society for Information Display. Issue Online: 25 September 2020; Version of Record online: 25 September 2020.

Additional details

Created:
August 22, 2023
Modified:
October 20, 2023