Scalable fabrication of nano-architected materials using 3D interference lithography with metasurfaces at visible wavelengths (Conference Presentation)

Abstract

Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.

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