Published January 2002
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Photo-patternable gelatin as protection layers in surface micromachinings
Chicago
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Abstract
This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
Additional Information
© 2002 IEEE. The authors appreciate the financial support of this work from the National Science Council, Taiwan ROC, with the project number of NSC-89-2217-E-032-001. The authors also want to thank the helps from Mr. Yong Xu and Mr. T.N. Pornsin-Sirirak of the Micromachining group, Caltech, USA.Attached Files
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Additional details
- Eprint ID
- 94146
- Resolver ID
- CaltechAUTHORS:20190326-111642883
- National Science Council (Taipei)
- NSC-89-2217-E-032-001
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2019-03-26Created from EPrint's datestamp field
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2021-11-16Created from EPrint's last_modified field