Published October 1996
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A wafer-scale MEMS and analog VLSI system for active drag reduction
Chicago
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Abstract
We describe an analog CMOS VLSI system that can process real-time signals from integrated shear stress sensors to detect regions of high shear stress along a surface in an airflow. The outputs of the CMOS circuit control the actuation of integrated micromachined flaps with the goal of reducing this high shear stress on the surface and thereby lowering the total drag. We have designed, fabricated, and tested components of this system in a wind tunnel in both laminar and turbulent flow regimes with the goal of building a wafer-scale system.
Additional Information
© 1996 IEEE. This work is supported in part by the Center for Neuromorphic Systems Engineering as a part of the National Science Foundation Engineering Research Center Program under grant EEC-9402726, and by the California Trade and Commerce Agency, Office of Strategic Technology under grant C94-0165. This work 1s also supported in part by ARPA-IONR under grant no N00014-93-1-0990, and by an AFOSR University Research Initiative grant no F49620-93-1-0332.Attached Files
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Additional details
- Eprint ID
- 94007
- Resolver ID
- CaltechAUTHORS:20190320-151208784
- Center for Neuromorphic Systems Engineering, Caltech
- NSF
- EEC-9402726
- California Trade and Commerce Agency
- C94-0165
- Office of Naval Research (ONR)
- N00014-93-1-0990
- Air Force Office of Scientific Research (AFOSR)
- F49620-93-1-0332
- Created
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2019-03-20Created from EPrint's datestamp field
- Updated
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2021-11-16Created from EPrint's last_modified field