Published February 25, 2004
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Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared
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Abstract
The Four Quadrant Phase Mask is a key component for the design of advanced coronagraphs that may be used to search exo-planets. The validity of this concept has been demonstrated in the visible and need now to be demonstrated in the mid infrared. For this purpose, two components are manufactured for wavelengths 4.75 and 16.25 μm. This manufacturing requires the deposition of ZnSe layers using Ion Assisted Deposition, followed by a lift off process.
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© 2004 Society of Photo-optical Instrumentation Engineers (SPIE).Attached Files
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Additional details
- Alternative title
- Manufacturing of 4-Quadrant Phase Mask for nulling Interferometry in thermal infrared
- Eprint ID
- 92316
- Resolver ID
- CaltechAUTHORS:20190116-104008025
- Created
-
2019-01-18Created from EPrint's datestamp field
- Updated
-
2021-11-16Created from EPrint's last_modified field
- Series Name
- Proceedings of SPIE
- Series Volume or Issue Number
- 5250