Investigation of reliability of the cutoff probe by a comparison with Thomson scattering in high density processing plasmas

Abstract

A "cutoff probe" uses microwaves to measure the electron density in a plasma. It is particularly attractive because it is easy to fabricate and use, its measurement is immune to surface contamination by dielectric materials, and it has a straightforward analysis to measure electron density in real time. In this work, we experimentally investigate the accuracy of the cutoff probe through a detailed comparison with Thomson scattering in a low temperature, high density processing plasma. The result shows that the electron density measured by the cutoff probe is lower than that by Thomson scattering and that the discrepancy of the two results becomes smaller as the gap between the two tips increases and/or the neutral gas pressure decreases. The underestimated electron density found by the cutoff probe can be explained by the influence of the probe holder, which becomes important as the pressure increases and the gap gets closer.

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