Published April 1974
| Published
Journal Article
Open
Final stage of the charge-transfer process in charge-coupled devices
- Creators
- Daimon, Yoshiaki
- Mohsen, Amr M.
- McGill, T. C.
Chicago
Abstract
The final stages of transfer of charge from under a storage gate is formulated analytically including both fringing-field induced drift and diffusion. Analytic solutions to these equations are presented for constant fringing fields, and a system of equations for spatially varying fields is developed. Approximate solutions for spatially varying fringing fields, when combined with a lumped-parameter model of the self-induced field effects, are shown to give a reasonably accurate representation of the free-charge transfer process.
Additional Information
© 1974 IEEE. Manuscript received May 29, 1973. This work was supported in part by the Office of naval Research under Grant N00014-67-A-0094-0032 and the Naval Research Laboratories under Grant 00173-3-006252.Attached Files
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Additional details
- Eprint ID
- 80032
- Resolver ID
- CaltechAUTHORS:20170809-145049065
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