Published October 1978
| Published
Journal Article
Open
Holographic interference lithography for integrated optics
- Creators
- Ng, Willie W.
- Hong, Chi-Shain
- Yariv, Amnon
Chicago
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Abstract
In this paper, some of our recent work in the use of holographic interference lithography and various material removal techniques to corrugate thin-film optical waveguides are reviewed. The specific applications of these periodic thin-film devices in the distributed feedback and distributed Bragg reflector semiconductor laser, and as output grating couplers, are described. Recent results in the use and fabrication of chirped and curved-line gratings are also summarized.
Additional Information
© 1978 IEEE. Manuscript received February 29, 1978; revised June 15,1978. This work was supported by the Air Force Office of Scientific Research and the National Science Foundation.Attached Files
Published - 01479645.pdf
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01479645.pdf
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Additional details
- Eprint ID
- 79898
- Resolver ID
- CaltechAUTHORS:20170807-175352913
- Air Force Office of Scientific Research (AFOSR)
- NSF
- Created
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2017-08-08Created from EPrint's datestamp field
- Updated
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2021-11-15Created from EPrint's last_modified field