Published March 2017
| public
Book Section - Chapter
Antireflective textured silicon optics at millimeter and submillimeter wavelengths
Abstract
Silicon optics with broadband antireflective (AR) treatments are being developed for millimeter and submillimeter-wave applications. Combined photolithography and deep reactive ion etching (DRIE) techniques are used to texture the surfaces of high resistivity, low loss silicon wafers. We report on the design, fabrication, and testing at 250 GHz of single and double layer AR treatments on silicon optics.
Additional Information
© 2017 IEEE. This research was carried out with partial support from NASA (NNX15AE01G) at the California Institute of Technology, the Caltech Submillimeter Observatory Hilo office, and at the Jet Propulsion Laboratory, operated by the California Institute of Technology under a contract with the National Aeronautics and Space Administration.Additional details
- Eprint ID
- 77741
- Resolver ID
- CaltechAUTHORS:20170524-164519696
- NNX15AE01G
- NASA
- Created
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2017-05-25Created from EPrint's datestamp field
- Updated
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2021-11-15Created from EPrint's last_modified field
- Caltech groups
- Astronomy Department