Published May 2007
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Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers
Chicago
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Abstract
We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45nm using electron-beam lithography for surface structure lasers with large areas.
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© 2007 OSA.Attached Files
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- CaltechAUTHORS:20170420-124216144
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2017-04-20Created from EPrint's datestamp field
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2019-10-03Created from EPrint's last_modified field