Published May 2008
| Published
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Resonantly Enhanced Near-Field Lithography
- Creators
- Tsang, Mankei
- Psaltis, Demetri
Abstract
We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator.
Additional Information
© 2008 Optical Society of America.Attached Files
Published - 04572940.pdf
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- Eprint ID
- 76645
- Resolver ID
- CaltechAUTHORS:20170418-172015272
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2017-04-19Created from EPrint's datestamp field
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2019-10-03Created from EPrint's last_modified field