Published April 25, 2017
| Supplemental Material + Accepted Version
Journal Article
Open
Functionalized 3D Architected Materials via Thiol-Michael Addition and Two-Photon Lithography
Chicago
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Abstract
Fabrication of functionalized 3D architected materials is achieved by a facile method using functionalized acrylates synthesized via thiol-Michael addition, which are then polymerized using two-photon lithography. A wide variety of functional groups can be attached, from Boc-protected amines to fluoroalkanes. Modification of surface wetting properties and conjugation with fluorescent tags are demonstrated to highlight the potential applications of this technique.
Additional Information
© 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. Version of record online 20 February 2017; manuscript revised 22 December 2016; manuscript received 30 September 2016. D.W.Y. and M.D.S. contributed equally to this work. This study was supported by a grant from the National Institutes of Health (Grant No. 1R01CA194533). The authors acknowledge support from the Molecular Materials Research Center of the Beckman Institute at the California Institute of Technology. Imaging was performed in the Biological Imaging Facility, with the support of the Caltech Beckman Institute and the Arnold and Mabel Beckman Foundation. The authors also acknowledge Mr. Soichi Hirokawa for performing the fluorescence microscopy, Dr. Alexandre Persat for his help with the confocal microscopy, Dr. Zachary Sternberger for image processing assistance, Dr. Lucas Meza for two-photon lithography support, and Dr. Stéphane Delalande for discussions concerning polymer synthesis. The authors declare no competing financial interest.Attached Files
Accepted Version - nihms872861.pdf
Supplemental Material - adma201605293-sup-0001-S1.pdf
Supplemental Material - adma201605293-sup-0002-S2.avi
Supplemental Material - adma201605293-sup-0003-S3.avi
Files
nihms872861.pdf
Additional details
- Alternative title
- Functionalized Three-dimensional Architected Materials via Thiol-Michael Addition and Two-photon Lithography
- PMCID
- PMC5529122
- Eprint ID
- 74439
- Resolver ID
- CaltechAUTHORS:20170221-153709555
- NIH
- 1R01CA194533
- Caltech Beckman Institute
- Arnold and Mabel Beckman Foundation
- Created
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2017-02-22Created from EPrint's datestamp field
- Updated
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2022-04-04Created from EPrint's last_modified field