Rapid Prototyping of Site-Specific Nanocontacts by Electron and Ion Beam Assisted Direct-Write Nanolithography

Abstract

Rapid prototyping of bottom-up nanostructure circuits is demonstrated, utilizing metal deposition and patterning methodology based on combined focused ion and electron beam induced decomposition of a metal−organic precursor gas. Ohmic contacts were fabricated using electron beam deposition, followed by the faster process of ion beam deposition for interconnect formation. Two applications of this method are demonstrated:  three-terminal transport measurements of Y-junction carbon nanotubes and fabrication of nanocircuits for determination of electromechanical degradation of silver nanowires.

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