Published February 14, 1969
| public
Journal Article
Ion Implantation Studies in Silicon
- Creators
- Eriksson, L.
- Davies, J. A.
- Mayer, J. W.
Chicago
An error occurred while generating the citation.
Abstract
"Channeling" techniques have been applied to the study of ion implantation in silicon.
Additional Information
© 1969 American Association for the Advancement of Science.Additional details
- Eprint ID
- 62831
- DOI
- 10.1126/science.163.3868.627
- Resolver ID
- CaltechAUTHORS:20151211-155449249
- Created
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2015-12-11Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field