Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published May 2007 | public
Journal Article

Devices, Structures, and Processes for Optical MEMS

Abstract

New processes and devices in the area of optical microelectromechanical systems (MEMS) as researched in the Berkeley Sensor & Actuator Center (BASC) are described. A technique and fabrication procedure is presented to produce high-quality microlenses at selected locations in a micro-optical system. Polarization beam splitters are produced by another process, and their performance is measured and described. A new, much simplified process to fabricate vertically offset comb actuating structures is applied in the design of high-performance scanners, which are in turn used to control a laser ablation system. Very favorable performance comparisons are demonstrated between the researched system and a conventional commercial laser ablation system. A second system demonstration is a prototype Shack–Hartmann (SH) sensor, in which microlenses are mounted in carriages that can be individually addressed using the selectivity of their mechanically resonant mountings. This design is shown to increase markedly the dynamic range in wave aberration to which the SH sensor can be applied. A final application of optical MEMS design is to a reduced-size, enhanced-performance, phase shifting interferometer.

Additional Information

Copyright © 2007 Institute of Electrical Engineers of Japan. Received 27 November 2006. The authors would like to recognize their highly productive partnership over years with Kishan Gupta (presently a student at the UCLA medical center), Rishi Kant (presently a graduate student at Stanford University), David Garmire (UC Berkeley), and Prof. J. Demmel (UC Berkeley). Also, the authors thank Prof. J. Bokor at UC Berkeley and Prof. C. R. Pollock at Cornell University for helpful technical discussions. Prof. O. Solgaard of Stanford University has generously accommodated our labspace needs and optical characterization tool uses, and the authors would like to express their appreciation to him. They also want to thank the employees of the UC Berkeley Microlab for assistance provided on numerous occasions, especially K. Voros for accommodating our experimental needs, R. Hamilton for providing essential help on setting up the polymer jet printing system, Matthew Wasilik for developing silicon etch recipes, and Marilyn Kushner for making photolithography masks in a timely manner. Finally, the authors gratefully acknowledge the NSF and Alex Schwarzkopf for supporting their work under NSF EECO318642 and CITRIS NSF TR22325. Patent applications have been filed for several of the designs and processes described in this paper.

Additional details

Created:
August 19, 2023
Modified:
October 23, 2023