A modified molecular beam instrument for the imaging of radicals interacting with surfaces during plasma processing
Abstract
A new instrument employing molecular beam techniques and laser induced fluorescence(LIF) for measuring the reactivity of gas phase radicals at the surface of a depositing film has been designed and characterized. The instrument uses an inductively coupled plasma source to create a molecular beam containing essentially all plasma species. A tunable excimer pumped dye laser is used to excite a single species in this complex molecular beam.LIF signals are imaged onto a gated, intensified charge coupled device (ICCD) to provide spatial resolution. ICCD images depict the fluorescence from molecules both in the molecular beam and scattering from the surface of a depositing film. Data collected with and without a substrate in the path of the molecular beam provide information about the surface reactivity of the species of interest. Here, we report the first measurements using the third generation imaging of radicals interacting with surfaces apparatus. We have measured the surface reactivity of SiH molecules formed in a 100% SiH_4 plasma during deposition of an amorphous hydrogenated silicon film. On a 300 K Si (100) substrate, the reactivity of SiH is near unity. The substrate temperature dependence (300–673 K) of the reactivity is also reported. In addition, reactivity measurements for OH molecules formed in a water plasma are presented. In contrast to the SiH molecule, the reactivity of OH radicals is 0.55±0.05 on the surface of a Si (100) substrate.
Additional Information
© 1997 American Institute of Physics. (Received 4 October 1996; accepted for publication 11 December 1996) Support for this research comes from the Office of Naval Research and Sandia National Laboratories. The authors also acknowledge support from Colorado State University through the Faculty Diversity Career Enhancement Fund and Faculty Research Grants program.Attached Files
Published - 1.1147976.pdf
Files
Name | Size | Download all |
---|---|---|
md5:778c3b1659ca2588b838e363a5729920
|
1.4 MB | Preview Download |
Additional details
- Eprint ID
- 58416
- Resolver ID
- CaltechAUTHORS:20150622-144456802
- Office of Naval Research (ONR)
- Sandia National Laboratories
- Colorado State University
- Created
-
2015-06-22Created from EPrint's datestamp field
- Updated
-
2021-11-10Created from EPrint's last_modified field