Published March 19, 1993
| public
Journal Article
Boundary Layer Profiles in Plasma Chemical Vapor Deposition
Chicago
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Abstract
A nonlinear optical spectroscopy based on degenerate four-wave mixing has made possible direct measurements of species temperature and concentration profiles through the boundary layer of a reactive plasma at atmospheric pressure. Spectra were obtained for CH and C_2 radicals over a range of conditions including those for the plasma chemical vapor deposition of diamond films. Numerical simulations based on a one-dimensional stagnation-point flow model are in good agreement with the measurements. The CH mole fraction is shown to rise and fall as a function of distance from the substrate, which is compelling experimental evidence for the complex chemistry that is occurring in the plasma boundary layer.
Additional Information
© 1993 American Association for the Advancement of Science. 26 October 1992; Accepted 23 December 1992. D.S.G. is a Natural Science and Engineering Research Council (Canada) postdoctoral fellow. S.W. is an Air Force Office of Scientific Research graduate scholar. This work was supported by several sources: C.H.K. acknowledges support from the Department of Energy under contract DE-FG03-88ER13957 and R.N.Z. from the Department of Energy under contract DE-FG03-92ER14304.Additional details
- Eprint ID
- 53481
- DOI
- 10.1126/science.259.5102.1726
- Resolver ID
- CaltechAUTHORS:20150109-114647059
- Department of Energy (DOE)
- DE-FG03-88ER13957
- Department of Energy (DOE)
- DE-FG03-92ER14304
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2015-01-09Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field