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Published January 2015 | public
Journal Article

Limiting Light Escape Angle in Silicon Photovoltaics: Ideal and Realistic Cells

Abstract

Restricting the light escape angle within a solar cell significantly enhances light trapping, resulting in potentially higher efficiency in thinner cells. Using an improved detailed balance model for silicon and neglecting diffuse light, we calculate an efficiency gain of 3%_(abs) for an ideal Si cell of 3-µm thickness and the escape angle restricted to 2.767° under AM1.5 direct illumination. Applying the model to current high-efficiency cell technologies, we find that a heterojunction-type device with better surface and contact passivation is better suited to escape angle restriction than a homojunction type device. In these more realistic cell models, we also find that there is little benefit gained by restricting the escape angle to less than 10°. The benefits of combining moderate escape angle restriction with low to moderate concentration offers further efficiency gains. Finally, we consider two potential structures for escape angle restriction: a narrowband graded index optical multilayer and a broadband ray optical structure. The broadband structure, which provides greater angle restriction, allows for higher efficiencies and much thinner cells than the narrowband structure.

Additional Information

© 2014 IEEE. Manuscript received June 29, 2014; revised September 11, 2014; accepted September 17, 2014. Date of publication October 22, 2014; date of current version December 18, 2014. The work of E. D. Kosten and H. A. Atwater was supported by the Light–Matter Interactions Energy Frontier Research Center: an EFRC program of the Office of Science, United States Department of Energy, under Grant DE-SC0001293. The work of E. D. Kosten was supported by the Resnick Sustainability Institute Graduate Fellowship. The work of J. V. Lloyd was supported by the DOW Chemical Company. Work at the Center for Nanophotonics at AMOLF is part of the research program of FOM, which is financially supported by NWO. It is also supported by the European Research Council. E. D. Kosten and B. K. Newman contributed equally to this work. The authors would like to thank M. Sheldon, H. Emmer, and W. Sinke for insightful discussions and advice on the manuscript.

Additional details

Created:
August 20, 2023
Modified:
October 19, 2023