Published January 1971
| Published
Journal Article
Open
Current Flow through Thin Insulating Films: Basic Principles and Device Applications
- Creators
-
Mead, Carver A.
Chicago
Abstract
The fundamental physics underlying current flow through thin insulating films is reviewed, with emphasis placed on those experiments central to the identification of the dominant current flow mechanism in a given structure. Recent data obtained on metal-insulator-metal structures incorporating single crystal thin films represents unambiguous observation of both thermionic emission and tunneling. Device applications of thin films are also summarized.
Additional Information
© 1971 American Vacuum Society.Attached Files
Published - 1.1316370.pdf
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- Eprint ID
- 52839
- Resolver ID
- CaltechAUTHORS:20141215-165521589
- Created
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2014-12-16Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field