Sticking probabilities for sputtered Ag and Au atoms incident on oxidized aluminum surfaces
Abstract
We have measured the sticking probabilities for sputtered Ag and Au atoms incident on oxidized aluminum surfaces as a function of the areal density of deposited atoms. For Ag sputtered by 200 keV Ar ions, we found a sticking probability at zero coverage of k(0) = 0.46 ± 0.20. For very high coverages, we found k(n > 10^(17)at./cm^2) = 0.80 ± 0.20. For Au sputtered by 200 keV Ar ions, w found k(0) = 0.92 ± 0.08 and k(n > 10^(17)at./cm^2) = 0.80 ± 0.03. For Au sputtered by 200 keV Xe ions, values of k(0) = 0.98 ± and k(n > 10^(17)at./cm^2) = 0.89 ± 0.03 were obtained. In all cases, the sticking probability varied noticeably for densities between o and twenty monolayers. For Au, a maximum value near 1 was observed in this region while for Ag, the sticking probability exhibited a minimum of approximately 35%. Some possible explanations for these results are offered and the implications for collection-type sputtering experiments are discussed.
Additional Information
© 1989 Elsevier Science Publishers B.V. Received 19 September 1988 and in revised form 5 January 1989. Available online 11 October 2002. Supported in part by U.S.D.O.E. Contract No. DEAC02-76ER03074 and a Cottrell Research Grant from the Research Corporation at Yale and by the National Science Foundation [DMR 86-15641] at Caltech. The authors gratefully acknowledge the assistance of L. Baumel and M. Kaurin with the sputtering runs. We are also grateful to P. Miller, P. Pepmiller and M.T. Robinson for several very helpful conversations during a related measurement at Oak Ridge National Laboratory.Additional details
- Eprint ID
- 51235
- Resolver ID
- CaltechAUTHORS:20141104-114413191
- DEAC02-76ER03074
- Department of Energy (DOE)
- Research Corporation Cottrell Fellowship
- DMR 86-15641
- NSF
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2014-11-04Created from EPrint's datestamp field
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2021-11-10Created from EPrint's last_modified field