Published 1989
| public
Journal Article
Electronic effects in MeV ion tracks affecting thin film adhesion
Abstract
An ion track model was applied to describe MeV ion induced adhesion improvement of Au thin films on amorphous SiO_2. Good agreement with experimental data was found when assuming that ion track energy densities above and below a certain interval do not contribute to the adhesion enhancement; damage effects detrimental to adhesion may be associated with the high energy densities in the vicinity of the ion path.
Additional Information
© 1989 Gordon and Breach Science Publishers, Inc. Received: 16 Nov 1988; published online: 19 Aug 2006. This work was supported in part by the National Swedish Board for Technical Development, and partly by the National Science Foundation (DMR86-15641).Additional details
- Eprint ID
- 51222
- Resolver ID
- CaltechAUTHORS:20141104-101347699
- National Swedish Board for Technical Development
- DMR86-15641
- NSF
- Created
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2014-11-04Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field