Published January 1993
| public
Journal Article
High-Temperature Hardness of Chemically Vapor-Deposited Diamond
Chicago
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Abstract
The hardness of chemically vapor-deposited diamond is examined at elevated temperatures. Diamond films of 400-μm thickness are grown on silicon substrates by plasma-enhanced chemical vapor deposition with subsequent removal of the substrate by chemical etching. Vickers hardness measurements were performed in the temperature range of 500°–950°C in an inert gas environment and under 7-N load. A 30% reduction in hardness from the room-temperature value is observed above 800°C.
Additional Information
© 1993 The American Ceramic Society. Manuscript No. 195394. Received August 19, 1992; approved November 10, 1992. Support of this work was provided for D. R. M. and K. T. F. by the National Science Foundation under Grant No. HRD-19023629.Additional details
- Eprint ID
- 49435
- Resolver ID
- CaltechAUTHORS:20140908-181328787
- NSF
- HRD-19023629
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2014-09-12Created from EPrint's datestamp field
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2021-11-10Created from EPrint's last_modified field