Published 2013
| public
Book Section - Chapter
Block Copolymer Lithography
- Creators
- Boyd, David A.
- Other:
- Suib, Steven L.
Abstract
This chapter presents block copolymer lithography (BCPL) in light of engineering nanoscale architectures for catalytic applications. It begins with an introduction to the basic phenomenology of block copolymers and then follows with highlights of recent advances in block copolymer science. An overview of the methods and materials commonly used in BCPL is provided. Important results involving BCPL in current research including heterogeneous catalysis, advanced material growth, and plasmonics are presented. Finally, challenges and outlook for BCPL are discussed.
Additional Information
© 2013 Elsevier B. V.Additional details
- Eprint ID
- 42526
- Resolver ID
- CaltechAUTHORS:20131118-112325692
- Created
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2013-11-18Created from EPrint's datestamp field
- Updated
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2021-11-10Created from EPrint's last_modified field