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Published February 2013 | public
Journal Article

High-resolution computational imaging of leaf hair patterning using polarized light microscopy

Abstract

The leaf hairs (trichomes) on the aerial surface of many plant species play important roles in phytochemical production and herbivore protection, and have significant applications in the chemical and agricultural industries. Trichome formation in the model plant Arabidopsis thaliana also presents a tractable experimental system to study cell differentiation and pattern formation in plants and animals. Studies of this developmental process suggest that trichome positioning may be the result of a self-forming pattern, emerging from a lateral inhibition mechanism determined by a network of regulatory factors. Critical to the continued success of these studies is the ability to quantitatively characterize trichome pattern phenotypes in response to mutations in the genes that regulate this process. Advanced protocols for the observation of changes in trichome patterns can be expensive and/or time consuming, and lack user-friendly analysis tools. In order to address some of these challenges, we describe here a strategy based on polarized light microscopy for the quick and accurate measurement of trichome positions, and provide an online tool designed for the quantitative analyses of trichome number, density and patterning.

Additional Information

© 2012 The Authors. The Plant Journal © 2012 Blackwell Publishing Ltd. Received 3 October 2012; accepted 2 November 2012; published online 10 January 2013. We would like to thank Dr Rebecca Lamb for helpful discussions throughout this project and her suggestion of polarized light microscopy as an imaging method for trichomes. We would also like to thank Joan Leonard for her help in gathering samples of plant species other than Arabidopsis. Finally, we would like to thank Dr Miroslava Zhiponova for sharing her leaf-clearing protocol with us. Support for this project was in part provided by NSF DBI-1049341 to E.G. and J.B.

Additional details

Created:
August 22, 2023
Modified:
October 23, 2023