Published December 17, 2012
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Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides
Abstract
We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.
Additional Information
© 2012 American Institute of Physics. Received 7 September 2012; accepted 6 December 2012; published online 21 December 2012. This work has been supported by the French National Agency (ANR) through LETI Carnot Funding. We acknowledge the LETI CMOS platform team for assistance in sample fabrication and K. Gilbert for technical contribution to the optical experiments.Attached Files
Published - ApplPhysLett_101_251117.pdf
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ApplPhysLett_101_251117.pdf
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Additional details
- Eprint ID
- 36558
- Resolver ID
- CaltechAUTHORS:20130124-084326829
- Agence Nationale pour la Recherche (ANR)
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2013-01-24Created from EPrint's datestamp field
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2023-10-20Created from EPrint's last_modified field