Published 1983
| public
Journal Article
Ion Mixing
- Creators
- Matteson, S.
- Nicolet, M-A.
Chicago
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Abstract
Ion mixing is a novel processing technique for the fabrication of new materials with unique properties. The phenomenon is also often responsible for redistribution of ion-implanted impurities, for artifacts in sputter depth profiling techniques, and for modifications of the properties of the first walls in TOKAMAK-typplaes ma reactors. In this review we attempt to systematically introduce the reader to this exciting and rapidly expanding subject; we emphasize the relevant experimental results to date and summarize the present theoretical understanding.
Additional Information
© 1983 Annual Reviews Inc. Published August 1983. The authors would like to acknowledge the many helpful suggestions of their colleagues in the Material Science Laboratory of Texas Instruments, Incorporated, and at the California Institute of Technology. We especially. acknowledge helpful discussions with Dr. R. J. Gaboriaud of Laboratoire de Metallurgie physique, Poitier, France, and Dr. B. M. Paine of the California Institute of Technology. This work was executed under the benevolent U.R. fund of the Boehmische Physical Society (B. M. Ullrich) and was financially supported in part by the United States Department of Energy through an agreement with the National Aeronautics and Space Administration, monitored by the Jet Propulsion Laboratory, California Institute of Technology (D. B. Bickler).Additional details
- Eprint ID
- 32425
- DOI
- 10.1146/annurev.ms.13.080183.002011
- Resolver ID
- CaltechAUTHORS:20120713-112400215
- Boehmische Physical Society
- Department of Energy (DOE)
- NASA/JPL/Caltech
- Created
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2012-07-13Created from EPrint's datestamp field
- Updated
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2021-11-09Created from EPrint's last_modified field