Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published March 9, 1987 | Published
Journal Article Open

Chemical effects in ion mixing of a ternary system (metal-SiO_2)

Abstract

The mixing of Ti, Cr, and Ni thin films with SiO_2 by low‐temperature (−196–25 °C) irradiation with 290 keV Xe has been investigated. Comparison of the morphology of the intermixed region and the dose dependences of net metal transport into SiO_2 reveals that long range motion and phase formation probably occur as separate and sequential processes. Kinetic limitations suppress chemical effects in these systems during the initial transport process. Chemical interactions influence the subsequent phase formation.

Additional Information

© 1987 American Institute of Physics. Received 31 July 1986; accepted for publication 12 January 1987. This work was financially supported in part by the Office of Naval Research under contract No. N00014-84-K-0275 and by the National Science Foundation under grant No. DMR-8421119. T. Ban well thanks IBM for a fellowship during this work.

Attached Files

Published - BANapl87.pdf

Files

BANapl87.pdf
Files (350.5 kB)
Name Size Download all
md5:bfc97a3d257e3b8da8ff6096f03668de
350.5 kB Preview Download

Additional details

Created:
August 19, 2023
Modified:
October 17, 2023