Published March 9, 1987
| Published
Journal Article
Open
Chemical effects in ion mixing of a ternary system (metal-SiO_2)
Chicago
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Abstract
The mixing of Ti, Cr, and Ni thin films with SiO_2 by low‐temperature (−196–25 °C) irradiation with 290 keV Xe has been investigated. Comparison of the morphology of the intermixed region and the dose dependences of net metal transport into SiO_2 reveals that long range motion and phase formation probably occur as separate and sequential processes. Kinetic limitations suppress chemical effects in these systems during the initial transport process. Chemical interactions influence the subsequent phase formation.
Additional Information
© 1987 American Institute of Physics. Received 31 July 1986; accepted for publication 12 January 1987. This work was financially supported in part by the Office of Naval Research under contract No. N00014-84-K-0275 and by the National Science Foundation under grant No. DMR-8421119. T. Ban well thanks IBM for a fellowship during this work.Attached Files
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Additional details
- Eprint ID
- 32022
- Resolver ID
- CaltechAUTHORS:20120622-075340401
- Office of Naval Research (ONR)
- N00014-84-K-0275
- NSF
- DMR-8421119
- Created
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2012-06-22Created from EPrint's datestamp field
- Updated
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2021-11-09Created from EPrint's last_modified field