Latent image diffraction from submicron photoresist gratings

Abstract

Light scattering from latent images in photoresist is useful for lithographic tool characterization, process monitoring, and process control. In particular, closed‐loop control of lithographic processes is critical for high yield, low cost device manufacturing. In this work, we report use of pulsed laser diffraction from photoresist latent images in 0.24 μm pitch distributed feedback laser gratings. Gated detection of pulsed light scattering permits high spatial resolution probing using ultraviolet light without altering the latent image. A correlation between latent image and etched grating diffraction efficiencies is demonstrated and shows the value of "upstream" monitoring.

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