Published February 1998
| public
Book Section - Chapter
Fractal capacitors
Chicago
Abstract
This paper introduces a high-density linear capacitor structure with low bottom-plate parasitics. The density of such a structure improves as process technologies scale. Fractal capacitors retain the linearity of metal-to-metal capacitors with limited degradation of Q. The structures automatically limit the length of the thin metal sections to a few microns, keeping the series resistance reasonably small. Another advantage is the reduction of bottom-plate capacitance because of the smaller area.
Additional Information
© 1998 IEEE. Date of Current Version: 06 August 2002. The authors acknowledge T. Ahrens for helpful discussions.Additional details
- Eprint ID
- 28807
- DOI
- 10.1109/ISSCC.1998.672459
- Resolver ID
- CaltechAUTHORS:20120117-110114752
- Created
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2012-01-17Created from EPrint's datestamp field
- Updated
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2021-11-09Created from EPrint's last_modified field
- Other Numbering System Name
- INSPEC Accession Number
- Other Numbering System Identifier
- 5999076