Synthesis and Characterization of Mixed Methyl/Allyl Monolayers on Si(111)
Abstract
The formation of mixed methyl/allyl monolayers has been accomplished through a two-step halogenation/alkylation reaction on Si(111) surfaces. The total coverage of alkylated Si, the surface recombination velocities, and the degree of surface oxidation as a function of time have been investigated using X-ray photoelectron spectroscopy, Fourier-transform infrared spectroscopy, and microwave conductivity measurements. The total coverage of alkyl groups, the rate of oxidation, and the surface recombination velocities of Si(111) terminated by mixed monolayers were found to be close to those observed for CH_3−Si(111) surfaces. Hence, the mixed-monolayer surfaces retained the beneficial properties of CH_3−Si(111) surfaces while allowing for convenient secondary surface functionalization.
Additional Information
© 2010 American Chemical Society. Received: November 30, 2009; Revised Manuscript Received: July 12, 2010. Publication Date (Web): August 19, 2010. Part of the "Michael R. Wasielewski Festschrift". This work was supported by the National Science Foundation (CHE-0911682), BP, and the Molecular Materials Research Center of the Beckman Institute at the California Institute of Technology. The authors acknowledge Dr. Kate Plass, Dr. Shannon Boettcher, and Mr. Andrey Poletayev for insightful discussions.Attached Files
Supplemental Material - jp911379c_si_001.pdf
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Additional details
- Eprint ID
- 21380
- DOI
- 10.1021/jp911379c
- Resolver ID
- CaltechAUTHORS:20101215-114031395
- CHE-0911682
- NSF
- Caltech Beckman Institute
- BP
- Created
-
2010-12-15Created from EPrint's datestamp field
- Updated
-
2023-03-16Created from EPrint's last_modified field
- Caltech groups
- Kavli Nanoscience Institute