Advanced silicon processing for active planar photonic devices

Abstract

Using high quality, anisotropically etched Si waveguides bonded to InGaAsP, the authors demonstrate a hybrid laser, whose optical profile overlaps both Si and III-V regions. Continuous wave laser operation was obtained up to 45 °C, with single facet power as high as 12.7 mW at 15 °C. Planar Si optical resonators with Q = 4.8 × 10^6 are also demonstrated. By using a SF_6/C_(4)F_8 reactive ion etch, followed by H_(2)SO_4/HF surface treatment and oxygen plasma oxide, the optical losses due to the waveguide and the bonding interface are minimized. Changes of optical confinement in the silicon are observed due to waveguide width variation.

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