Published September 15, 2007
| public
Journal Article
Open
Ultralow-threshold Yb3+:SiO2 glass laser fabricated by the solgel process
- Creators
- Ostby, Eric P.
- Yang, Lan
-
Vahala, Kerry J.
Abstract
A Yb-doped silica microcavity laser on a silicon chip is fabricated from a solgel thin film. The high-Q microtoroid cavity, which has a finesse of 10,000, is evanescently coupled to an optical fiber taper. We report a threshold of 1.8 μW absorbed power that is, to the best of our knowledge, the lowest published threshold to date for any Yb-doped laser. The effect of Yb3+ concentration on laser threshold is experimentally quantified.
Additional Information
© 2007 Optical Society of America. Received July 5, 2007; accepted July 25, 2007; posted August 3, 2007 (Doc. ID 84873); published September 4, 2007. This work was financially supported by MURI grant FA9550-04-1-0434 and the Defense Advanced Research Projects Agency (DARPA) Center for Optofluidic Integration.Files
OSTol07.pdf
Files
(156.1 kB)
| Name | Size | Download all |
|---|---|---|
|
md5:a76d049743dcd81ea2ee2f0159aedae8
|
156.1 kB | Preview Download |
Additional details
- Eprint ID
- 9176
- Resolver ID
- CaltechAUTHORS:OSTol07
- Created
-
2007-11-09Created from EPrint's datestamp field
- Updated
-
2020-03-09Created from EPrint's last_modified field