Temperature dependence of species concentrations near the substrate during diamond chemical vapor deposition
- Creators
- Corat, E. J.
- Goodwin, D. G.
Abstract
Measurements have been made of the temperature dependence of CH3, CH4, and C2H2 very near the substrate during filament-assisted diamond growth. CH3 was detected using (2+1) resonance-enhanced multiphoton ionization (REMPI), and CH4 and C2H2 concentrations were measured using sampling mass spectrometry. A strong dependence of the CH3 REMPI signal on substrate temperature was observed, which at low temperatures may be characterized as having an activation energy of approximately 4±1 kcal/mole. Methane and acetylene, on the other hand, are relatively independent of substrate temperature. These results are most likely due to recombination of methyl to methane or ethane in the cool gas layer near the substrate or on the surface at low substrate temperatures.
Additional Information
Copyright © 1993 American Institute of Physics (Received 3 August 1992; accepted 9 April 1993) We would like to thank Dr. Jay Jeffries (SRI), Dr. Steve Harris (General Motors), Professor Terry Cool (Cornell), and Dr. U. Meier (DLR) for useful discussions regarding the REMPI measurements. This work is supported, in part, by the Office of Naval Research, under contract N00014-90-J-1386, with an additional equipment grant from the AT&T Foundation. One of us (EJC) gratefully acknowledges support from the Conselho National de Desenvolvimento Cientifico e Tecnologico, Brazil.Files
| Name | Size | Download all |
|---|---|---|
|
md5:f62a3200962dacc06afce8cd9627362f
|
1.1 MB | Preview Download |
Additional details
- Eprint ID
- 1409
- Resolver ID
- CaltechAUTHORS:CORjap93
- Created
-
2006-01-17Created from EPrint's datestamp field
- Updated
-
2021-11-08Created from EPrint's last_modified field