Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published October 28, 1996 | Published
Journal Article Open

Fabrication of high frequency nanometer scale mechanical resonators from bulk Si crystals

Abstract

We report on a method to fabricate nanometer scale mechanical structures from bulk, single-crystal Si substrates. A technique developed previously required more complex fabrication methods and an undercut step using wet chemical processing. Our method does not require low pressure chemical vapor deposition of intermediate masking layers, and the final step in the processing uses a dry etch technique, avoiding the difficulties encountered from surface tension effects when wet processing mechanically delicate or large aspect ratio structures. Using this technique, we demonstrate fabrication of a mechanical resonator with a fundamental resonance frequency of 70.72 MHz and a quality factor of 2 x 10^(4).

Additional Information

© 1996 American Institute of Physics. Received 21 June 1996; accepted 22 August 1996. The authors acknowledge Dr. Axel Scherer for many valuable conversations, and for use of his reactive ion etch system. This work was supported by ARPA under Contract No. DABT63-95-C-0112.

Attached Files

Published - CLEapl96.pdf

Files

CLEapl96.pdf
Files (289.7 kB)
Name Size Download all
md5:139876a7017f25d9fef4510ee64a64c0
289.7 kB Preview Download

Additional details

Created:
August 22, 2023
Modified:
October 16, 2023