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Published March 27, 2006 | Published
Journal Article Open

Measuring the role of surface chemistry in silicon microphotonics

Abstract

Utilizing a high quality factor (Q~1.5×10^6) optical microresonator to provide sensitivity down to a fractional surface optical loss of alphas[prime]~10^–7, we show that the optical loss within Si microphotonic components can be dramatically altered by Si surface preparation, with alphas[prime]~1×10^–5 measured for chemical oxide surfaces as compared to alphas[prime]<=1×10^–6 for hydrogen-terminated Si surfaces. These results indicate that the optical properties of Si surfaces can be significantly and reversibly altered by standard microelectronic treatments, and that stable, high optical quality surface passivation layers will be critical in future Si micro- and nanophotonic systems.

Additional Information

© 2006 American Institute of Physics (Received 13 December 2005; accepted 7 March 2006; published online 31 March 2006) This work was supported by DARPA through the EPIC program. One of the authors (M.B.) thanks the Moore Foundation, NPSC, and HRL Laboratories.

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August 22, 2023
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