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Published July 1996 | public
Journal Article Open

Microscopic processes during electron cyclotron resonance microwave nitrogen plasma-assisted molecular beam epitaxial growth of GaN/GaAs heterostructures: Experiments and kinetic modeling

Abstract

A set of delta-GaNyAs1–y/GaAs strained-layer superlattices grown on GaAs (001) substrates by electron cyclotron resonance (ECR) microwave plasma-assisted molecular beam epitaxy (MBE) was characterized by ex situ high resolution X-ray diffraction (HRXRD) to determine nitrogen content y in the nitrided GaAs monolayers as a function of growth temperature T. A first order kinetic model is introduced to quantitatively explain this y(T) dependence in terms of an energetically favorable N for As anion exchange and thermally activated N-surface desorption and surface segregation processes. The nitrogen surface segregation process, with an estimated activation energy Es ~ 0.9 eV appears to be significant during the GaAs overgrowth of GaNyAs1–y layers, and is shown to be responsible for strong y(T) dependence.

Additional Information

©1996 American Vacuum Society (Received 22 January 1996; accepted 16 April 1996) This work was supported by Advanced Research Project Agency, and monitored by Office of Naval Research under Grant No. N00014-92-J-1845. Additionally, two of us (R.J.H. and M.L.O.) wish to acknowledge the support of Air Force Office of Scientific Research under Contract Nos. F49620-93-1-0211 and F49620-93-1-0389, and the support of the Advanced Research Projects Agency, monitored through the Army Research Office under Contract No. DAAH04-94-G-0393.

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August 22, 2023
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