Anti-reflective sub-wavelength patterning of IR optics
Abstract
Thermal infrared (IR) lenses require efficient anti-reflection coating. Moth-eye (or egg-box) 2D subwavelength gratings have demonstrated their ability to reach a very high transmission for a wide wavelength and angular range. The use in thermal IR is simplified by the lower resolution for lithographic technology, compared to visible waveband. However, deeper structures must be engraved and lithography must be adapted to IR materials. In order to be cost-effective, the patterning must be produced by replication techniques, such as embossing. Our laboratory is now experimenting hot embossing of moth-eye patterns in chalcogenide substrates. In this paper, theoretical analysis, micro-lithographic technology and manufacturing processes are detailed.
Additional Information
© 2006 Society of Photo-Optical Instrumentation Engineers (SPIE). CSL acknowledges the Walloon region for financial support through the Euclid/Europa program.Attached Files
Published - 63950L.pdf
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Additional details
- Alternative title
- Antireflective subwavelength patterning of IR optics
- Eprint ID
- 95554
- Resolver ID
- CaltechAUTHORS:20190517-082622240
- Euclid/Europa Program
- Created
-
2019-05-20Created from EPrint's datestamp field
- Updated
-
2021-11-16Created from EPrint's last_modified field
- Series Name
- Proceedings of SPIE
- Series Volume or Issue Number
- 6395