Plasmonic nanostructures through DNA-assisted lithography
Abstract
Programmable self-assembly of nucleic acids enables the fabrication of custom, precise objects with nanoscale dimensions. These structures can be further harnessed as templates to build novel materials such as metallic nanostructures, which are widely used and explored because of their unique optical properties and their potency to serve as components of novel metamaterials. However, approaches to transfer the spatial information of DNA constructions to metal nanostructures remain a challenge. We report a DNA-assisted lithography (DALI) method that combines the structural versatility of DNA origami with conventional lithography techniques to create discrete, well-defined, and entirely metallic nanostructures with designed plasmonic properties. DALI is a parallel, high-throughput fabrication method compatible with transparent substrates, thus providing an additional advantage for optical measurements, and yields structures with a feature size of ~10 nm. We demonstrate its feasibility by producing metal nanostructures with a chiral plasmonic response and bowtie-shaped nanoantennas for surface-enhanced Raman spectroscopy. We envisage that DALI can be generalized to large substrates, which would subsequently enable scale-up production of diverse metallic nanostructures with tailored plasmonic features.
Additional Information
© 2018 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution License 4.0 (CC BY). Submitted 7 September 2017. Accepted 8 January 2018. Published 2 February 2018. We thank E. Hulkko, H. Häkkänen, J. A. Ihalainen, M. Pettersson, T. A. Puurtinen, J. Simonen (University of Jyväskylä), and S. Tuukkanen (Tampere University of Technology) for discussions and valuable comments. Funding: This work was supported by the Academy of Finland (projects 130900, 135193, 218182, 263526, 286845, and 289947), the Jane and Aatos Erkko Foundation, the Finnish Cultural Foundation, the Finnish Academy of Science and Letters (Vilho, Yrjö and Kalle Väisälä Foundation), the Emil Aaltonen Foundation, and the U.S. Office of Naval Research (award no. N000141410702). The work was carried out under the Academy of Finland Centres of Excellence Programme (2014–2019). Author contributions: B.S., V.L., and J.J.T. conceived the study and, together with K.T., S.P., T.L., A.G., K.V.G., and M.A.K., designed the experiments. B.S. performed the lithography of the samples. B.S. and K.T. performed AFM and SEM imaging and optical measurements. V.L. conceived, designed, fabricated, and characterized the DNA origami nanostructures and contributed to the development of the lithography method. A.G. and K.V.G. contributed to the design of the chiral DNA origami and to the optimization of its deposition procedure. S.P. carried out simulations related to optical measurements. T.L. performed the SERS measurements. B.S., V.L., K.T., M.A.K., and J.J.T. prepared the main manuscript. All authors discussed the results, analyzed the data, and commented on the manuscript. The authors declare that they have no competing interests. Data and materials availability: All data needed to evaluate the conclusions in the paper are present in the paper and/or the Supplementary Materials. Additional data related to this paper may be requested from the authors.Attached Files
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Additional details
- PMCID
- PMC5804581
- Eprint ID
- 84661
- Resolver ID
- CaltechAUTHORS:20180205-070003799
- 130900
- Academy of Finland
- 135193
- Academy of Finland
- 218182
- Academy of Finland
- 263526
- Academy of Finland
- 286845
- Academy of Finland
- 289947
- Academy of Finland
- Jane and Aatos Erkko Foundation
- Finnish Cultural Foundation
- Finnish Academy of Science and Letters (Vilho, Yrjö and Kalle Väisälä Foundation)
- Emil Aaltonen Foundation
- N000141410702
- Office of Naval Research (ONR)
- Created
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2018-02-05Created from EPrint's datestamp field
- Updated
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2022-03-17Created from EPrint's last_modified field